Structure and
Composition of Crystalline Carbon Nitride Films Synthesized by Microwave Plasma Chemical
Vapor Deposition |
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Abstract: | Crystalline
carbon nitride thin films were prepared on Si (100) substrates by a microwave plasma
chemical vapor deposition method, using CH4/N2 as precursor gases. The surface
morphologies of the carbon nitride films deposited on Si substrate at 830℃ are consisted
of hexagonal crystalline rods. The effect of substrate temperature on the formation of
carbon nitrides was investigated. X-ray photoelectron spectroscopy analysis indicated that
the maximum value of N/C in atomic ratio in the films deposited at a substrate temperature
of 830℃ is 1.20, which is close to the stoichiometric value of C3N4. The X-ray
diffraction pattern of the films deposited at 830℃ indicates no amorphous phase in the
films, which are composed of - and -C3N4 phase containing an unidentified C-N phase.
Fourier transform infrared spectroscopy supports the existence of C-N covalent bond. |
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