超声振动辅助激光退火对FTO薄膜光电性能的影响

在激光退火处理掺氟二氧化锡(FTO)透明导电薄膜过程中引入超声振动, 研究了超声振动辅助激光退火对FTO薄膜晶体结构、表面形貌和光电性能的影响。结果表明: 与未施加超声振动时相比, 该方法可使薄膜上下位移而引起激光聚焦状态发生连续变化, 由此保证薄膜处于最佳退火范围内, 同时还可使薄膜表面激光熔融区域的颗粒被振动分散, 由此抑制颗粒团聚, 提高颗粒分布的均匀性和致密度, 最终有效地改善薄膜的光电性能。当振动功率为300 W时, 薄膜表面结构最为均匀、致密和平整, 此时光电性能达到最佳, 它在400~800 nm波段的平均透光率为84.7%, 方块电阻为9.0 Ω/□。

Ultrasonic-Vibration-Assisted Laser Annealing on Photoelectric Properties of FTO Thin Films

A novel way, i.e. introducing ultrasonic vibration during the laser annealing process, was developed for treating fluorine-doped tin oxide (FTO) transparent conducting thin films. The influences of ultrasonic-vibration-assisted laser annealing on crystal structure, surface morphology and photoelectric properties of the FTO films were investigated. The experimental results indicated that application of ultrasonic vibration during laser annealing caused the films to move up and down and thus brought about a continuous change in laser focusing state, ensuring the films to be in the optimum location to undergo laser annealing. Meanwhile, it could enable the particles in the laser-molten zone on the film surfaces to be dispersed through vibration, thus restraining the agglomeration of the particles and enhancing the uniformity and compactness of the films. As a result, photoelectric properties of the FTO films were effectively improved. It was found that the FTO film obtained by using a vibration power of 300 W was more uniform, compact and smooth, thereby yielding the optimal photoelectric properties with an average optical transmittance of 84.7% in the waveband range of 400~800 nm and a sheet resistance of 9.0 Ω/□.