TiAlN/VN纳米多层膜的微结构与力学和摩擦学性能

采用反应磁控溅射制备了TiAlN/VN纳米多层膜, 并使用X射线衍射分析(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、纳米压痕仪和多功能摩擦磨损试验机对多层膜的微结构与力学和摩擦学性能进行了表征和分析。研究结果表明: 不同调制周期的TiAlN/VN多层膜均呈典型的柱状晶生长结构, 插入VN层并没有打断TiAlN涂层柱状晶的生长。在一定调制周期下, TiAlN/VN纳米多层膜中的TiAlN和VN层之间能够形成共格生长结构, 其硬度和弹性模量相比于TiAlN单层膜均有显著提升, 其中, TiAlN (10 nm)/VN (10 nm)的硬度和弹性模量最大增量分别达到39.3%和40.9%。TiAlN/VN纳米多层膜的强化主要与其共格界面生长结构有关。另外, TiAlN单层膜的摩擦系数较高(~0.9), 通过周期性地插入摩擦系数较低的VN层能够使得TiAlN的摩擦系数大大降低, TiAlN/VN纳米多层膜的摩擦系数最低为0.4。

Microstructure,Mechanical and Tribological Property of TiAlN/VN Nano-multilayer Films

A series of TiAlN/VN nano-multilayer films were prepared by reactive magnetron sputtering method. The effects of modulation structure on the microstructural evolution, mechanical and tribological properties were investigated by X-ray diffractometer, scanning electron microscope, high-resolution transmission electron microscope, nano- indention device and high vacuum tribometer. The results show that the structure of TiAlN/VN nano-multilayer films with different modulation periods are all typical columnar crystals. Meanwhile, the insertion of the VN sublayers does not interrupt the columnar crystal growth of TiAlN sublayers. In the TiAlN/VN nano-multilayer films, TiAlN sublayers grow coherently and epitaxially over VN sublayers under the critical modulation period. Correspondingly, the hardness and the modulus of the TiAlN/VN nano-multilayer films increase significantly, and the maximum hardness and elastic modulus of TiAlN (10 nm)/VN (10 nm) nano-multilayer films increase by about 39.3% and 40.9% compared with the TiAlN single film, respectively. The strengthening of the TiAlN/VN nano-multilayer films can be attributed to the coherent interfacial structure. In addition, the friction coefficient of TiAlN single film is about 0.9, while that of TiAlN/VN nano-multilayer films can be decreased significantly and reaches a minimum value of ~0.4 by the periodic insertion of the VN sublayers with lower friction coefficient ~0.3.