Use of photodegradable inhibitors in UV-curable compositions to form polymeric 2D-structures by visible light |
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| Authors: | Sergey Nickolayevich Mensov Gleb A. Abakumov Maxim V. Arsenyev Maxim A. Baten'kin Sergey A. Chesnokov Alexey N. Konev Yuri V. Polushtaytsev Margarita P. Shurygina Maria Yu. Zakharina |
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| Affiliation: | 1. G.A. Razuvaev Institute of Organometallic Chemistry of Russian Academy of Science (RAS), Nizhny Novgorod, Russia;2. G.A. Razuvaev Institute of Organometallic Chemistry of Russian Academy of Science (RAS), Nizhny Novgorod, Russia Lobachevsky State University of Nizhny Novgorod, Nizhny Novgorod, Russia |
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| Abstract: | The process of two-wave photopolymerization of a UV-curable composition with an optically degrading inhibitor is considered. By numerical simulation, it is shown that in the composition layer uniformly exposed to UV-radiation, such systems allow getting segments with different conversion under the action of inhomogeneous visible light. Based on the data on the photopolymerization kinetics of the compositions from triethylene glycol dimethacrylate (TEGDMA) and bisphenol-A glycidyl dimethacrylate (bis-GMA) with the UV-initiator 2,2-dimethoxy-2-phenylacetophenone (DMPA), it was shown that 3,5-di-tert-butyl-o-benzoquinone (35Q) with N,N-dimethylaniline (DMA, “Aldrich”, 99%) can serve as an inhibitor that degrades under action of visible radiation. Combining inhomogeneous visible light generated with a conventional DLP-projector and uniform UV-radiation of LED (365 nm) the two-wave lithographic process was implemented to create polymeric 2D-structures in 20 μm layer of the compositions from TEGDMA (70)/bis-GMA (30)/DMPA (0.05 wt%)/35Q (0.5 wt%)/DMA (1 wt%). |
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| Keywords: | applications kinetics photopolymerization radical polymerization |
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