| 金刚石薄膜的低压气相沉积工艺及发展 |
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| 引用本文： | 李惠琪 李惠东. 金刚石薄膜的低压气相沉积工艺及发展[J]. 表面技术, 1991, 20(6): 1-7 |
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| 作者姓名： | 李惠琪 李惠东 |
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| 作者单位： | 山东矿业学院，山东矿业学院，山东矿业学院，山东矿业学院 |
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| 摘 要： | 低压气相沉积金刚石薄膜的工艺,按基本原理可分为化学气相沉积、离子束沉积、等离子化学沉积和化学转化方法。文中详细介绍了各类方法的特点及沉积机理,指出存在的问题,并对今后的发展提出了看法。
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| 关 键 词： | 金刚石 薄膜 气相沉积 工艺 |
Study on the Low Pressure Gas Phase Deposition of Diamond Film |
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| Lee Huiqi,Lee Huidong,Huo Wanku , Xu Qingxin. Study on the Low Pressure Gas Phase Deposition of Diamond Film[J]. Surface Technology, 1991, 20(6): 1-7 |
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| Authors: | Lee Huiqi Lee Huidong Huo Wanku & Xu Qingxin |
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| Affiliation: | Shandong Mining Industrial College |
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| Abstract: | The process for low pressure gas phase deposition of diamond film can be divided into chemical gas phase deposition, ion beam deposition, plasma chemical deposition and chemical conversion based on the fundamental principles. This paper introduces in detail the characteristics of various methods and the deposition mechanisms, points out the existing problems and puts forward its viewpoints for the future development. |
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| Keywords: | diamond.film gas phase deposition |
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