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以PVA为溶剂ZnO薄膜的液相法制备及其机理研究
引用本文:岳美琼,魏贤华,张磊.以PVA为溶剂ZnO薄膜的液相法制备及其机理研究[J].功能材料,2010,41(1).
作者姓名:岳美琼  魏贤华  张磊
作者单位:西南科技大学,材料科学与工程学院,四川,绵阳,621010
基金项目:国家自然科学基金资助项目(50802078)
摘    要:以聚乙稀醇(PVA)水溶液为溶剂,采用液相法制备了高度c轴取向的ZnO薄膜。采用XRD、Raman以及AFM分析了退火温度与涂层厚度对ZnO薄膜的影响。结果表明,随着退火温度的提高,ZnO薄膜的结晶度及其均方根粗糙度有所提高;同时厚度的增加使得ZnO薄膜的单一取向性减弱。其生长机理可表述为:在每一层涂层中一致或不一致的成核同时产生,通过层内与层间晶粒的聚合、联并,最后形成具有(002)取向的柱状与颗粒状并存的ZnO连续膜。

关 键 词:PVA  ZnO薄膜  退火温度  厚度  生长机理  

Preparation and growth mechanism of ZnO thin films by chemical solution deposition with PVA
YUE Mei-qiong,WEI Xian-hua,ZHANG Lei.Preparation and growth mechanism of ZnO thin films by chemical solution deposition with PVA[J].Journal of Functional Materials,2010,41(1).
Authors:YUE Mei-qiong  WEI Xian-hua  ZHANG Lei
Affiliation:School of Materials Science and Engineering;Southwest University of Science and Technology;Mianyang 621010;China
Abstract:Highly c-axis oriented zinc oxide (ZnO) thin films were prepared by CSD with polyvinyl alcohol (PVA). The effect of annealing temperature and coating thickness on the ZnO thin films was characterized by XRD,Raman and AFM. It was shown that crystallinity and the root-mean-square of these thin films were enhanced with increasing annealing temperature in some degree. Meanwhile,the c-axial orientation of the ZnO films decreased with increasing the coating thickness. Growth mechanism can be described as follows:...
Keywords:PVA  ZnO thin film  annealing temperature  coating thickness  growth mechanism  
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