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Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si
引用本文:ManBao-Yuan LiuAi-Hua 等. Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si[J]. 核技术(英文版), 1998, 9(2): 98-101
作者姓名:ManBao-Yuan LiuAi-Hua 等
作者单位:[1]DepartmentofPhysics,ShandongNormalUniversity,Jinan250014,China [2]DepartmentofPhysics,ShandongNormalUniv
摘    要:The suraface morphological changesd produced by Nd:YAG pulsed laser ablation of metal Al and semiconductor Si were carefully examined and analyzed by using scanning elkectron microscope.The formation mechanism of the droplets was discussed.and the reasons for formation of the microcracks on the laser irradiated area of the target surface were analyzed by calculating the thermal stress,the vapor pressure and the shock pressure induced by the laser supported detonation.

关 键 词:金属铝 半导体硅 脉冲激光烧蚀 表面损伤

Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si
Man Bao-Yuan, Liu Ai-Hua and Wang Xiang-Tai. Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si[J]. , 1998, 9(2): 98-101
Authors:Man Bao-Yuan   Liu Ai-Hua  Wang Xiang-Tai
Abstract:The surface morphological changes produced by Nd:YAG pulsed laser ablation of metal Al and semiconductor Si were carefully examined and analyzed by using scanning electron microscope. The formation mechanism of the droplets was discussed, and the reasons for formation of the microcracks on the laser irradiated area of the target surface were analyzed by calculating the thermal stress, the vapor pressure and the shock pressure induced by the laser supported detonation.
Keywords:Laser damage   Thermal stress   Shock pressure
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