| 无掩膜腐蚀与伺服型电容式微加速度计 |
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| 引用本文： | 袁明权,彭勃,赵龙,武蕊,唐海林,席仕伟,谭刚.无掩膜腐蚀与伺服型电容式微加速度计[J].信息与电子工程,2009,7(5):432-434. |
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| 作者姓名： | 袁明权 彭勃 赵龙 武蕊 唐海林 席仕伟 谭刚 |
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| 作者单位： | 中国工程物理研究院,电子工程研究所,四川,绵阳621900 |
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| 基金项目： | 中国工程物理研究院科学技术发展基金重点资助项目 |
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| 摘 要： | 为了解决“三明治”这类微器件制作的深窄槽结构成型问题，运用无掩膜湿法腐蚀技术，成型悬臂梁雏形后再成型质量块，较好地实现了悬臂梁与质量块同时准确成型，研制出±70g和±5g两种不同量程的微加速度计。样品测试表明，利用这项技术所制作的微加速度计相对精度皆优于1×10^-4。其中，±70g量程的残差可控制在7mg以内，非线性可达0．02％；±5g量程的残差在0．4mg左右。
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| 关 键 词： | 微电子机械系统 微加速度计 无掩膜腐蚀 氧化 微机械加工 残差 |
Maskless etching and server capacitance micro-accelerometer |
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| YUAN Ming-quan,PENG Bo,ZHAO Long,WU Rui,TANG Hai-lin,XI Shi-wei,TAN Gang.Maskless etching and server capacitance micro-accelerometer[J].information and electronic engineering,2009,7(5):432-434. |
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| Authors: | YUAN Ming-quan PENG Bo ZHAO Long WU Rui TANG Hai-lin XI Shi-wei TAN Gang |
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| Affiliation: | (Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang Sichuan 621900, China) |
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| Abstract: | Processing deep-narrow groove is the key of sandwich micro-device process. With the maskless wet chemical etching, the cantilever rudiment and the mass were made, and the structure of sandwich micro-accelerometer was manufactured accurately. Two kinds of micro-accelerometer were successfully fabricated with ± 70 g/± 5 g full-scale range. Initial testing showed ： relative precision less than 1 × 10^-4, residual error 0.4 mg with ± 5 g full-scale range, nonlinearity 0.02% and residual error 7 mg with ± 70 gfull-scale range. |
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| Keywords: | micro electromechanical system micro-accelerometer maskless etching oxidation micro-machining residual error |
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