真空压强对小模数花键离子渗氮性能的影响

小模数花键零件在离子渗氮过程中,经常出现齿根或节圆位置渗不上和渗层浅等问题。针对这一问题,选取典型转子类零件,通过在300、400、500、600、700 Pa的真空压强下,对其内花键进行离子渗氮试验。研究得出当炉内通入氩气,真空压强为600、700 Pa 时,能够保证内花键齿顶、节圆、齿根的渗层偏差控制在设计所要求的0.02 mm以内,同时显微组织和表面硬度也符合工艺要求。

Effect of vacuum pressure on ion nitriding properties of small modulus spline

In the process of ion nitriding of small modulus spline parts, the tooth root or node circle position is often difficult to be nitrided or their nitrided layer is too shallow. Aiming at this problem, ion nitriding test was carried out on the internal spline of typical rotor parts under the vacuum pressure of 300, 400, 500, 600 and 700 Pa. The results show that when argon gas is injected into the furnace and the vacuum pressure is 600 and 700 Pa, the nitrided layer deviation of tooth top, joint circle and tooth root of the internal spline can be controlled within 0.02 mm and meet the technical design requirement, at the same time, the microstructure and surface hardness also meet the process requirements.