Structural and optical characterization of CdS and CdHgTe thin films for the fabrication of CdHgTe/CdS structure

This article presents the deposition and characterization of CdS and CdHgTe thin films for the fabrication of CdHgTe/CdS structure. The growth of CdS and CdHgTe thin films on FTO-coated conducting glass substrates have been performed by chemical bath deposition (CBD) and electrodeposition methods, respectively. The deposition conditions have been optimized for getting better quality layers of CdS and CdHgTe. The grown layers of both CdS and CdHgTe have been characterized by photoelectrochemical cell (PEC) measurement, X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–vis spectrophotometer. Annealing effect of the deposited films has also been investigated. Finally the fabrication of CdHgTe/CdS structure has been performed and investigated by I–V characteristics. PEC, XRD, SEM and UV–vis spectrophotometer studies reveal that chemically deposited CdS layers are n-type with band gap values vary from 2.29 to 2.41 eV and cubic with (111) preferential orientation, and have spherical grain distributed over the surface. However, electrodeposited CdHgTe layers are p-type with band gap values varying from 1.50 to 1.53 eV and cubic with highly oriented CdHgTe crystallites with the (111) planes parallel to the substrate, and have uniform distribution of granular grains over the surface. The fabricated CdHgTe/CdS structure gave an open-circuit photovoltage and a short-circuit photocurrent of 510 mV and 13 mA/cm² respectively, under AM 1.5 illumination.