磁控溅射参数对钛薄膜结构及阳极氧化的影响

采用直流磁控溅射的方法在导电玻璃(FTO)上制备柱状晶结构的钛薄膜,研究了磁控溅射电流和基底温度对溅射钛薄膜微观结构的影响,分析了柱状晶结构对后续阳极氧化TiO2纳米管结构的影响.利用场发射扫描电镜观察样品的形貌,X射线衍射(XRD)分析样品的晶型结构.结果表明,随着磁控溅射电流的增大,钛薄膜的晶粒尺寸增加,致密度先增大后减小,溅射电流过大过小都会降低薄膜的致密度;在300～450℃的温度区间,随基底温度的升高,钛薄膜的晶粒尺寸增加,致密度增加,柱状晶结构更均匀.将磁控溅射获得的钛薄膜进行阳极氧化处理,结果发现:排列致密的柱状晶钛薄膜有利于生长TiO2纳米管.

Effects of Deposition Parameters on Microstructure of Magnetron Sputtered Ti Films and the Following Anodization

The crystalline titanium films on conductive glass(FTO) with columnar structure were prepared by using DC magnetron sputtering approach in this paper.The influences of the sputtering current and substrate temperature on microstructure of titanium films were investigated.The impacts of columnar crystalline structure on the structural morphology of TiO2 nanotubes via anodization were also analysised.The morphology and structure of the samples were identified by means of field emission scanning electron microscope(FE-SEM) and X-ray diffractometry(XRD).It is found that,with the sputtering current increasing,the grain size of titanium film increases,but the denseness increases at first,and then decreases.Both grain size and the denseness of titanium films increase with the temperature from 300 ℃ to 450 ℃,and the columnar structure become more uniform.The anodization process is applied to the sputter-deposited titanium film and the results show that titanium films which have compact columnar crystalline structure are benefitial for the growth of TiO2 nanotubes.