| 多重全息存储中曝光均匀性的研究 |
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| 引用本文： | 忽满利,李育林,刘玉华,刘继芳,张培琨.多重全息存储中曝光均匀性的研究[J].四川激光,1999,20(3):23-26. |
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| 作者姓名： | 忽满利 李育林 刘玉华 刘继芳 张培琨 |
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| 作者单位： | 中国科学院西安光学精密机械研究所，西安电子科技大学应用物理系 |
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| 摘 要： | 本文分析了光折变晶体多重全息存储中扇形效对光栅写入时间常数的影响和写入光耦合光栅振幅的影响，给出了两种因素影响下角度编码多重全息存储中时间递减曝光法的计算公式和方法，该计算和通常的有所不同。
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| 关 键 词： | 时间递减法 多重全息存储 扇形效应 光耦合 |
Study on uniformity exposure in multiplex holographic storage |
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| Hu Manli,Li Yulin,Liu Yuhua,Liu Jifang,Zhang Peikun.Study on uniformity exposure in multiplex holographic storage[J].Laser Journal,1999,20(3):23-26. |
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| Authors: | Hu Manli Li Yulin Liu Yuhua Liu Jifang Zhang Peikun |
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| Abstract: | The influence of scattering effects on recording time constant has been analyzed in holographic storage in photorefractive crystal and so does the influence of light beam couple on grating amplitude.The formula and method to calculate the exposure time for multiplexed storage with the incremental recording technique have been presented.The calculated results have shown that the uniform and great grating can be obtained using the formula and method,accurate exposure time is one of the key to increase amount of storage. |
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| Keywords: | Incremental recording multiplex storage fanning effects beams couple |
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