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Annealing effects on the thermoelectric power of thin copper and silver films
Authors:Ho-Yuan Yu  William F Leonard
Affiliation:

Department of Electrical Engineering, Southern Methodist University, Dallas, Tex. 75275, U.S.A.

Abstract:The effect of annealing on the thermoelectric power of thin copper and silver films has been investigated. Using Matthiessen's rule, the thermoelectric power is separated into three components: S0 due to bulk lattice scattering, Ss due to surface scattering and Si due to scattering by imperfections. The values of S0 and Ss are independent of the film thickness, whereas Si varies with film thickness. However, Si approaches a constant value for both copper and silver when the film thickness is larger than 1000 Å. The values of Ss obtained for copper and silver films are 1.33 μV/°K and 3.23 μV/°K respectively. For thicker films (t>1000 Å), the values of Si for copper and silver films are 3.89 μV/°K and 9.63 μV/°K respectively.
Keywords:
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