Further investigation on the thermal decomposition of aluminium dialkylamides |
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Authors: | Yasutaka Takahashi Kenji Mutoh Seiji Motojima Kohzo Sugiyama |
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Affiliation: | (1) Department of Synthetic Chemistry, Faculty of Engineering, Gifu University, 504 Kakamigahara, Japan |
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Abstract: | Both dimethylamino- (I) and diethylamino-alane dimers (II), [(R2N)2AlH]2 (I, R=Me; II, R=Et) decompose above 800° C under a few hundred Pa of hydrogen to dark greyish, hard (Vickers hardness larger than 2000), oxidation-resistive and oxidation-protective deposits which are tentatively identified as Al5C3N. The deposits are stable to moisture and diluted hydrochloric acid in contrast to those obtained below 800° C, but they easily dissolve in sodium hydroxide solution at room temperature evolving a gas. The deposits on a stainless steel substrate adhere strongly to the substrate and remain so on rapid heating and cooling. The electrical resistivity of the deposits is in the range 102 to 104 cm. |
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