Further investigation on the thermal decomposition of aluminium dialkylamides

Both dimethylamino- (I) and diethylamino-alane dimers (II), [(R₂N)₂AlH]₂ (I, R=Me; II, R=Et) decompose above 800° C under a few hundred Pa of hydrogen to dark greyish, hard (Vickers hardness larger than 2000), oxidation-resistive and oxidation-protective deposits which are tentatively identified as Al₅C₃N. The deposits are stable to moisture and diluted hydrochloric acid in contrast to those obtained below 800° C, but they easily dissolve in sodium hydroxide solution at room temperature evolving a gas. The deposits on a stainless steel substrate adhere strongly to the substrate and remain so on rapid heating and cooling. The electrical resistivity of the deposits is in the range 10² to 10⁴ cm.