Silicon Oxynitride Ceramics Prepared by Plasma Activated Sintering of Nanosized Amorphous Silicon Nitride Powder without Additives |
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| Authors: | Lei Fan Zhongqi Shi Xuefeng Lu Chao Wang Meng Chen Yawen Li Hongjie Wang |
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| Affiliation: | 1. State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, , Xi'an, 710049 Shannxi, China;2. College of Engineering, Lawrence Technological University, , Southfield, Michigan, 48075 |
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| Abstract: | Si2N2O ceramics were prepared by plasma activated sintering using nanosized amorphous Si3N4 powder without sintering additives within a temperature range of 1400°C–1600°C in vacuum. A mixed Si–N4?n–On (n = 0, 1…4) amorphous structure was formed in the process of sintering, and Si2N2O crystals were nucleated where the local structure was similar with Si2N2O. After sintering at 1600°C, the Si2N2O ceramic was composed of elongated plate‐like Si2N2O grains and amorphous phase. The Si2N2O grains showed a width of less than 100 nm and a very high aspect ratio. |
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