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Use of Volume Element Methods to Understand Experimental Differences in Active/Passive Transitions and Active Oxidation Rates for SiC
Authors:Y Kubota  H Hatta  T Yoshinaka  Y Kogo  T Goto  T Rong
Affiliation:1. The Graduate University for Advanced Studies, Department of Space and Astronautical Science, , Sagamihara, Kanagawa, Japan;2. Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency, , Sagamihara, Japan;3. Japan Aerospace Exploration Agency, Aerospace Research and Development Directorate, , Chofu, Japan;4. Department of materials science and technology, Tokyo University of Science, , Noda, Japan;5. Institute for Materials Research, Tohoku University, , Sendai, Japan;6. State Key Lab of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, , Wuhan, China
Abstract:Quantitative evaluation of oxidation behavior of high‐temperature materials is imperative for applications in a Silicon carbide (SiC)‐based thermal protection system (TPS) of reentry space vehicles. However, the reported oxidation rates obtained using thermogravimetric analysis (TGA) have been widely varied among researchers. In this study, this variation is assumed to be attributable to differences in the oxygen partial pressure at the sample surface due to different configuration of the experimental devices. Existing data are usually given as a function of the surface temperature of a specimen TS with the partial pressure of oxygen in the input gas urn:x-wiley:00027820:media:jace12141:jace12141-math-0001 as a main parameter. However, even if urn:x-wiley:00027820:media:jace12141:jace12141-math-0002 and TS are set to the same, the oxygen partial pressure on specimen surface urn:x-wiley:00027820:media:jace12141:jace12141-math-0003 and gas temperature TG are expected to vary widely, respectively, from urn:x-wiley:00027820:media:jace12141:jace12141-math-0004, TS, and according to the difference in the oxidative environments. To evaluate these effects in various apparatuses, numerical calculations were conducted for the case of SiC. From these results, urn:x-wiley:00027820:media:jace12141:jace12141-math-0005 was found to be main source of the variation in oxidation rates.
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