| Investigation of kinetics model of dc reactive sputtering |
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| 引用本文： | 朱圣龙,王福会,吴维叓. Investigation of kinetics model of dc reactive sputtering[J]. 中国科学E辑(英文版), 1996, 0(4) |
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| 作者姓名： | 朱圣龙 王福会 吴维叓 |
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| 作者单位： | State Key Laboratory for Corrosion and Protection，Institute of Corrosion and Protection of Metals，Chinese Academy of Sciences，Shenyang 110015，China，State Key Laboratory for Corrosion and Protection，Institute of Corrosion and Protection of Metals，Chinese Academy of Sciences，Shenyang 110015，China，State Key Laboratory for Corrosion and Protection，Institute of Corrosion and Protection of Metals，Chinese Academy of Sciences，Shenyang 110015，China |
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| 基金项目： | Project supported by the Youth Foundation of the National Natural Science Foundation，the Natural Science Foundation of Liaoning Province. |
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| 摘 要： | A novel physical sputtering kinetics model for reactive sputtering is presented.Reactive gas gettering effects and interactions among the characteristic parameters have been taken into account in the model.The data derived from the model accorded fairly well with experimental results.The relationship between the values of initial oxide coverage on the target and the ready states was depicted in the model.This relationship gives reasons for the difference of the threshold of reactive gas fluxes (Q) from the metal sputtering region to the oxide sputtering region and in reverse direction.The discontinuities in oxide coverage on the target surface (θ) versus reactive gas fluxes (Q) are referred to as the effects of reactive gas partial pressure (p) upon the forming rates of oxide on the surfaces of target (V0).The diversity of the oxygen flux threshold results from the variance of the initial values of oxide coverage on target.
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Investigation of kinetics model of dc reactive sputtering |
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| ZHU Shenglong,WANG Fuhui and WU Weitao. Investigation of kinetics model of dc reactive sputtering[J]. Science in China(Technological Sciences), 1996, 0(4) |
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| Authors: | ZHU Shenglong WANG Fuhui WU Weitao |
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| Abstract: | |
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| Keywords: | reactive sputtering kinetics model physical sputtering model. |
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