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Electrical and optical properties of N-type Alx Ga1-x as grown by MO-VPE
Authors:J Hallais  J P André  A Mircea-Roussel  M Mahieu  J Varon  M C Boissy  A T Vink
Affiliation:(1) Laboratoires d’Electronique et de Physique Appliquée, 3, avenue Descartes, 94450 Limei1-Brévannes, France;(2) La Radiotechnique Compelec, Route de la Délivrande, 14001 Caen Cedex, France;(3) Philips Research Laboratories, Eindhoven, The Netherlands
Abstract:Growth conditions and properties of AlxGa1-xAs (0.1 ≤ × ≤O.3) using metalorganic vapour phase epitaxy (MO-VPE) are investigated. N-type is achieved either by silicon or by selenium doping. Properties of the layers are evaluated by Hall effect, cathodoluminescence and photoluminescence. It is shown that selenium doping leads to luminescent material : when x = O.1, the efficiency is only a factor of 2 smaller than for GaAs. Deposition temperature is a critical parameter : increasing the growth temperature yields more luminescent Alx Ga1-x As. This work has been partly supported by the Délégation à la Recherche Scientifique et Technique (D.G.R.S.T.)
Keywords:Aluminium-Gallium arsenides  epitaxy  vapour phase growth  luminescence  
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