Morphology and magnetic properties of electroplated Co-rich Co-Zn thin films |
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Authors: | Tzu-Shun Yang Naigang Wang David P Arnold |
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Affiliation: | (1) Interdisciplinary Microsystems Group (IMG), Department of Electrical and Computer Engineering, University of Florida, Gainesville, Florida 32611, USA;(2) Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611, USA |
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Abstract: | This work explores the microstructure and magnetic properties of electrodeposited Co-Zn thin films. Using pulse-reverse electroplating
technique, Co-rich Co-Zn films are deposited 0.4–1.9 μm thick from aqueous sulfate-based baths at low temperature (55°C).
The influence of current density (25–100 mA/cm2) and electrolyte Zn concentration (0–0.28 M) on the microstructure and magnetic properties are investigated. All of the Co-Zn
films exhibit higher out-of-plane coercivity, as compared to in-plane. With increasing current density, the out-of-plane coercivity
decreases from 50 to 40 kA/m (628–500 Oe). The influence of the Zn concentration in the electrolyte is more pronounced, affecting
the grain size, film composition, and magnetic properties. The best magnetic properties were obtained from a bath with 0.21 M
Zn and an average current density of 25 mA/cm2, resulting in a Co97Zn3 composition and an out-of-plane coercivity of 92 kA/m (1,160 Oe). |
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