Control of LPCVD ZnO growth modes for improved light trapping in thin film silicon solar cells |
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Authors: | S. Nicolay M. DespeisseF.-J. Haug C. Ballif |
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Affiliation: | Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin film electronics laboratory, EPFL-STI-IMT-NE, PV-LAB, Rue Breguet 2, CH-2000 Neuchâtel, Switzerland |
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Abstract: | By controlling the deposition parameters of low pressure chemical vapor deposition (LPCVD) grown ZnO transparent conductive oxide (TCO), we show that it is possible to achieve a switch of crystallographic orientations and to obtain novel surface nanotexture. The new layers are (0 0 0 2) oriented and exhibit light scattering at larger angles than state-of-the-art TCO used in thin film silicon solar cells. This property translates into a strong enhancement of the top amorphous cell current in micromorph tandem devices. |
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Keywords: | Transparent conductive oxide ZnO LPCVD MOCVD Thin film solar cell Light trapping |
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