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Control of LPCVD ZnO growth modes for improved light trapping in thin film silicon solar cells
Authors:S. Nicolay  M. DespeisseF.-J. Haug  C. Ballif
Affiliation:Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin film electronics laboratory, EPFL-STI-IMT-NE, PV-LAB, Rue Breguet 2, CH-2000 Neuchâtel, Switzerland
Abstract:By controlling the deposition parameters of low pressure chemical vapor deposition (LPCVD) grown ZnO transparent conductive oxide (TCO), we show that it is possible to achieve a switch of crystallographic orientations and to obtain novel surface nanotexture. The new layers are (0 0 0 2) oriented and exhibit light scattering at larger angles than state-of-the-art TCO used in thin film silicon solar cells. This property translates into a strong enhancement of the top amorphous cell current in micromorph tandem devices.
Keywords:Transparent conductive oxide   ZnO   LPCVD   MOCVD   Thin film solar cell   Light trapping
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