| 30kV高稳定度高压电源 |
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| 引用本文： | 陈振生. 30kV高稳定度高压电源[J]. 电工技术学报, 1989, 0(1) |
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| 作者姓名： | 陈振生 |
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| 作者单位： | 山东工业大学 |
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| 摘 要： | 本文介绍了为我校新型电子束曝光机所研制的30kV 高稳定度高压电源。该电源采用双闭环调整,集中补偿和分散补偿相结合的设计方案,满意地解决了静态精度和动态稳定性的矛盾。针对高压稳压电源的技术特点,对关键技术进行了适当处理,使各项技术指标均达到或超过原设计要求。
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| 关 键 词： | 电源 高压 电子束 高稳定度 |
High Stability Regulated Power Supply with 30kV High Voltage |
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| Chen Zhensheng. High Stability Regulated Power Supply with 30kV High Voltage[J]. Transactions of China Electrotechnical Society, 1989, 0(1) |
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| Authors: | Chen Zhensheng |
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| Affiliation: | Shandong Polytechnic University |
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| Abstract: | This paper recommends a high stability regulated power supply with 30kV high voltage.The power supply provides for a new type electron beam exposure machine developed by Shandong Polytechnic University.It adopts design scheme of donble closed loop regulation and design scheme of centralized compensation combin- ed with dispersed compensation.In accordance with the technical requirements of regulated power supply its key techniques have been properly handled.All its qua- lifications satisfy,or exceed the original design requirements. |
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| Keywords: | Power supply High voltage Electron beam High stability |
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