| 非晶硅基薄膜的等离子体刻蚀光发射谱检测 |
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| 引用本文： | 王长安,徐重阳.非晶硅基薄膜的等离子体刻蚀光发射谱检测[J].微细加工技术,1997(2):37-42. |
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| 作者姓名： | 王长安 徐重阳 |
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| 作者单位： | 华中理工大学固体电子学系!武汉，430074，华中理工大学固体电子学系!武汉，430074，华中理工大学固体电子学系!武汉，430074，华中理工大学固体电子学系!武汉，430074 |
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| 摘 要： | 本文研究了采用锁定放大相干检测技术的等离子体光发射谱检测系统。用该系统检测了仅用CF4作为刻蚀气体刻蚀非晶硅基薄膜的等离子体光发射谱。分析了检测结果和刻蚀机理。
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| 关 键 词： | 非晶硅基薄膜 a—Si：H TFT 等离子体刻蚀 光发射谱检测 |
A STUDY OF OPTICAL EMISSION SPECTRVM OF R. F. PLASMA DURING AMORPHOOS SILICON BASED FILM ETCHING |
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| Wang Changdn, Xu Chongyang Zhao Bofang, Yu Tianhong.A STUDY OF OPTICAL EMISSION SPECTRVM OF R. F. PLASMA DURING AMORPHOOS SILICON BASED FILM ETCHING[J].Microfabrication Technology,1997(2):37-42. |
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| Authors: | Wang Changdn Xu Chongyang Zhao Bofang Yu Tianhong |
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| Abstract: | In this paper, The coherent detection technique using a lock-in amplifief and the detection system for plasma optical emission spectrum are studied. The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected. The detected results and etching mechanisms are analysed. |
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| Keywords: | amorphous silicon based film a-Si: H TFT plasma etching optical emission spectrum detection |
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