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Dry phosphorus silicate glass etching for multicrystalline silicon solar cells |
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| Authors: | W A Nositschka O Voigt A Kenanoglu D Borchert H Kurz |
| Abstract: | A dry plasma etching process for phosphorus silicate glass (PSG) in a SiN‐PECVD batch reactor is developed. In the same reactor PSG etching and anti‐reflective coating (ARC) can be performed successively. To demonstrate industrial feasibility, screen‐printed solar cells are manufactured and compared with cells prepared by a standard wet chemical process. Copyright © 2003 John Wiley & Sons, Ltd. |
| Keywords: | multi‐crystalline silicon dry plasma etching PECVD PSG |