| 国际微电子专用关键设备的现状和发展趋势（考察报告） |
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| 引用本文： | 姚汉民,杨中山.国际微电子专用关键设备的现状和发展趋势（考察报告）[J].光电工程,1994,21(5):51-62. |
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| 作者姓名： | 姚汉民 杨中山 |
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| 作者单位： | 中国科学院光电技术研究所，中国科学院电工研究所 |
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| 摘 要： | 讲述了参观Ｓｅｍｉｃｏｎ／ｗｅｓｔ９４′展览会及考察美国和西德的５个公司、１所大学所了解到的投影光刻技术、电子束曝光技术、透镜面形测试技术的发展。
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| 关 键 词： | 投影式光刻机 电子束曝光机 面形测量 透镜 |
The Present Situation and Developing Trend of International Microelectronic Special and Key Equipments (Investigation Report) |
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| Yao Hanmin,Liu Yeyi,Zhao Peiyun.The Present Situation and Developing Trend of International Microelectronic Special and Key Equipments (Investigation Report)[J].Opto-Electronic Engineering,1994,21(5):51-62. |
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| Authors: | Yao Hanmin Liu Yeyi Zhao Peiyun |
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| Abstract: | We visited the Semicon/West 94' Exhibition,five companies and a university in Germany and America. Their projecting photolithography technology, Ebeam exposure technology and lens figure testing technology are presented in the paper. |
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| Keywords: | Projection photoetching machines Electron beam exposure devices Surface shape measurement Lenses Projection objectives |
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