| 脉冲溅射电源的设计及其应用 |
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| 引用本文： | 刘云峰 陈国平. 脉冲溅射电源的设计及其应用[J]. 电子器件, 1998, 21(4): 223-227 |
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| 作者姓名： | 刘云峰 陈国平 |
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| 作者单位： | 东南大学电子工程系 |
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| 摘 要： | 设计研制了脉冲溅射电源并用此电源制备了Ａｌ２Ｏ３薄膜，实验表明采用脉冲电源可以抑制溅射同的异常放电。
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| 关 键 词： | 脉冲溅射 电源 设计 化合物薄膜 |
Design of the Pulsed Sputtering Power Supply and Its Application |
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| Liu yunfeng Chen guoping. Design of the Pulsed Sputtering Power Supply and Its Application[J]. Journal of Electron Devices, 1998, 21(4): 223-227 |
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| Authors: | Liu yunfeng Chen guoping |
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| Affiliation: | Electronics Engineering Department of Southeast University |
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| Abstract: | The pulsed sputtering power supply was designed and manufactured, and with this supply Al 2O 3 films were prepared. The experiments indicated that the arcing on the sputtering target could be restrained by using the pulsed power supply. |
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| Keywords: | Pulsed sputtering Power supply design |
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