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Electrochemical deposition of MoS2 thin films by reduction of tetrathiomolybdate |
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| Authors: | E. A. Ponomarev, M. Neumann-Spallart, G. Hodes,C. L vy-Cl ment |
| Affiliation: | a Laboratoire de Physique des Solides de Bellevue, CNRS, UPR 1332, 1 Place Aristide Briand, 92195, Meudon, France b Department of Materials and Interfaces, Weizmann Institute of Science, Rehovot 76100, Israel |
| Abstract: | Molybdenum sulphide was cathodically electrodeposited from aqueous solutions of sodium tetrathiomolybdate. The as-deposited films were X-ray amorphous with a composition, measured by microprobe analysis, close to MoS2. Annealing these films in Ar resulted in highly-textured films of MoS2 with the van der Waals planes parallel to the substrate. A small expansion in the c spacing of the annealed films was explained by the presence of oxygen in the crystals. A direct bandgap of 1.78 eV was found for the annealed films. |
| Keywords: | Electrochemistry Semiconductors Molybdenum disulphide Deposition process |
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