Preparation and gas-sensing properties of α-Fe2O3 thin films |
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| Authors: | C. C. Chai J. Peng B. P. Yan |
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| Affiliation: | (1) Microelectronics Institute, Xidian University, 710071 Xi’an, Shaanxi, P. R. China |
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| Abstract: | Haematite (α-Fe2O3) thin films are prepared by two different chemical vapor deposition (CVD) processes: the atmospheric pressure CVD (APCVD) and the plasma enhanced CVD (PECVD). The films are analyzed by x-ray diffraction and scanning electron microscopy; their gas-sensing properties are also investigated. Experimental results show that APCVD α-Fe2O3 films are highly sensitive and selective to smoke while PECVD films are highly sensitive and selective to alcohol. A certain amount of quadrivalent metal in the films has an effect on their sensitivity and selectivity to gases. It is found that the films will “break down” under certain conditions. |
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| Keywords: | α -Fe2O3 thin films atmospheric pressure chemical vapor deposition (APCVD) gas-sensing property plasma-enhanced chemical vapor deposition (PECVD) |
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