| 码盘、圆光栅真空镀铬工艺的研究 |
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| 引用本文： | 陈赟,张学忱.码盘、圆光栅真空镀铬工艺的研究[J].长春理工大学学报,2005,28(1):103-105. |
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| 作者姓名： | 陈赟 张学忱 |
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| 作者单位： | [1]中国科学院长春光学精密机械与物理研究所，长春130031 [2]长春理工大学机电工程学院，长春130032 |
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| 基金项目： | 中国科学院知识创新工程项目 |
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| 摘 要： | 通过对码盘、圆光栅真空镀铬原理及膜层形成机理的分析,给出膜层厚度和影响其均匀性和致密性的主要因素之间的关系式以及安全成膜时被镀件的临界转速,为真空条件下获得厚度均匀、致密性好的铬膜提供了理论依据.
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| 关 键 词： | 真空镀铬 均匀性 致密性 临界转速 码盘 圆光栅 真空条件 镀铬工艺 研究 grating radial disc code plating 理论 铬膜 均匀性 膜层厚度 临界转速 镀件 成膜 安全 关系式 因素 |
| 文章编号： | 1672-9870(2005)01-0103-03 |
| 修稿时间： | 2004年10月10日 |
Vacuum plating Cr technics on code disc and radial grating |
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| CHEN Yun,ZHANG Xuechen.Vacuum plating Cr technics on code disc and radial grating[J].Journal of Changchun University of Science and Technology,2005,28(1):103-105. |
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| Authors: | CHEN Yun ZHANG Xuechen |
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| Abstract: | In the paper,the relations between uniformity and compactness of film thickness and the factors affecting the uniformity and compactness of film thickness are given. The critical rotating speed of vacuum plating Cr under the condition of ensuring plating Cr reliably is educed by analyzing the vacuum plating Cr theory of code disc and radial grating and the film forming mechanism. A theoretical basis is provided for abtaining uniform and compact Cr film on plating pieces under vacuum condition. |
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| Keywords: | vacuum plating Cr uniformity compactness critical rotating speed |
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