The use of metal filled via holes for improving isolation in LTCCRF and wireless multichip packages |
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Authors: | Ponchak G.E. Donghoon Chun Jong-Gwan Yook Katehi L.P.B. |
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Affiliation: | Electron. Device Technol. Branch, NASA Glenn Res. Center, Cleveland, OH; |
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Abstract: | LTCC MCM's for RF and wireless systems often use metal filled via holes to improve isolation between the stripline and microstrip interconnects. In this paper, results from a 3D-FEM electromagnetic characterization of microstrip and stripline interconnects with metal filled via fences for isolation are presented. It is shown that placement of a via hole fence closer than three times the substrate height to the transmission lines increases radiation and coupling. Radiation loss and reflections are increased when a short via fence is used in areas suspected of having high radiation. Also, via posts should not be separated by more than three times the substrate height for low radiation loss, coupling, and suppression of higher order modes in a package |
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