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Thermal expansion of siliconated pyrolytic carbon
Authors:K Aoki  M Y Cheng  T Hirai  S Yajima
Affiliation:(1) The Research Institute for Iron, Steel and Other Metals, Tohoku University, Sendai, Japan;(2) Present address: Tohoku Kyowa Carbon Ltd., Sendai, Japan;(3) Present address: Chung-Shan Institute of Science and Technology, Lung-Tan, Taiwan, Republic of China
Abstract:The lattice and bulk thermal expansions perpendicular to the layer plane of siliconated pyrolytic carbon, PC(Si), produced by pyrolyzing a mixture of propane gas and silicon tetrachloride vapour at the deposition temperatures of 1440 to 2025° C, have been measured over the temperature ranges 20 to 550° C and 20 to 960° C, respectively. The expansion behaviours of PC(Si) are related to the density and the degree of preferred orientation of crystallites, as is the case for pyrolytic carbon without silicon ldquoPCrdquo. At a deposition temperature of about 1700° C, the bulk thermal expansion coefficient of PC(Si) is about three times as large as that of PC.
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