Microlens lithography: A new approach for large display fabrication |
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Authors: | R Vlkel H P Herzig Ph Nussbaum W Singer R Dndliker W B Hugle |
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Affiliation: | Institute of Microtechnology, Rue Breguet 2, CH-2000, Neuchâtel, Switzerland |
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Abstract: | Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the image plane. Potential applications for microlens lithography are the fabrication of large area flat panel displays (FPD), color filters, and micromechanics. |
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