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Sub-micron calibration for ion beam milling of thin films |
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| Authors: | R.B. Irwin R.M. Wallace W.J. Choyke R.A. Hoffman |
| Affiliation: | University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA;University of Pittsburgh and Westinghouse R&D Center USA;Westinghouse R&D Center, Pittsburgh, Pennsylvania 15235, USA |
| Abstract: | Multiple beam interferometry and Rutherford backscattering spectrometry are used to extend the calibration of the amount of material removed by an ion miller to 2 nm. |
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