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The study of δ-doped InGaP/InGaAs/GaAs pseudomorphic high electron mobility transistor
Authors:Jia-Chuan Lin  Yu-Chieh Chen
Affiliation:a Department of Electrical Engineering, St. John's University, Taipei 251, Taiwan, ROC
b Institute of Automation and Mechatronics, St. John's University, Taipei 251, Taiwan, ROC
c Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan, ROC
Abstract:An enhancement-mode pseudomorphic high electron mobility transistor (E-mode pHEMT) with In0.49Ga0.51P/In0.25Ga0.75As/GaAs structure is studied in this paper. The two-dimensional device simulator, MEDICI, is used to solve the Poisson's equation and the electron/hole current continuity equations. An optimized δ-doped InGaP/InGaAs pHEMT structure is found to be superior to the conventional AlGaAs/InGaAs pHEMT. It reveals that the maximum drain-source current (IDS) goes up to 1600 mA/mm and transconductance (Gm) is 2120 mS/mm.
Keywords:HEMT   E-mode pHEMT   δ-Doped   Maximum drain-source current   Transconductance   MEDICI   Poisson's equation
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