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Change of the properties of nanostructured MoO3 thin films using gamma-ray irradiation |
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| Authors: | F. Chandoul A. Boukhachem F. Hosni H. Moussa M.S. Fayache M. Amlouk R. Schneider |
| Affiliation: | 1. Faculty of Mathematical, Physical and Natural Sciences of Tunis, University of Tunis El Manar, 2092 Tunis, Tunisia;2. Research Unit on Physics of Semiconductor Devices (UPDS), Faculty of Sciences of Tunis, 2092, Tunisia;3. Laboratory of Energy and Matter for Nuclear Sciences Development, CNSTN, 2020 Sidi-Thabet, Tunisia;4. Université de Lorraine, Laboratoire Réactions et Génie des Procédés, LRGP, UMR 7274, CNRS, 1 rue Grandville, BP 20451, 54001 Nancy Cedex, France |
| Abstract: | Thin films of Molybdenum trioxide (MoO3) were deposited on glass substrates by the spray pyrolysis at 500?°C and the samples were then exposed to gamma γ radiation doses by 60Co radioisotope at different doses (0.1, 10 and 50 kGy). The effects of gamma irradiation on the properties of MoO3 thin films were investigated. The XRD pattern and Raman spectroscopy of as-deposited MoO3 samples show an orthorhombic structure related to α-MoO3 with (0k0) preferred orientations. Uv‐vis spectra were studied to investigate the transmission measurements of MoO3 films. The optical energy band gap and Urbach energy were found to be gamma-dose dependent. Photoluminescence measurements at room temperature using 300?nm wavelength excitation were investigated. SEM images indicate the formation of α-MoO3 nanorods. |
| Keywords: | Thin film deposition Spray pyrolysis Gamma irradiation |
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