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Room temperature deposition of XRD-amorphous TiO2 thin films: Investigation of device performance as a function of temperature
Authors:Maria Luisa Grilli  Mehmet Yilmaz  Sakir Aydogan  Burcu Bozkurt Cirak
Affiliation:1. ENEA-Italian National Agency for New Technologies, Energy and Sustainable Economic Development, Energy Technology Department, Casaccia Research Centre, Via Anguillarese 301, 00123 Roma, Italy;2. Department of Science Teaching, Faculty of K. K. Education, Atatürk University, 25240 Erzurum, Turkey;3. Advanced Materials Research Laboratory, Department of Nanoscience and Nanoengineering, Graduate School of Natural and Applied Sciences, Ataturk University, 25240 Erzurum, Turkey;4. Department of Elect. & Elect. Engn., Faculty of Engineering, Ardahan University, 75000 Ardahan, Turkey;5. Department of Alternative Energy Sources, Vocational High School, Erzincan University, 24000 Erzincan, Turkey
Abstract:In this study, TiO2 thin films were fabricated by radio frequency sputtering at room temperature in pure Ar atmosphere starting from a 6?in. TiO2 target. The thickness of the films was controlled by deposition time and the effect of Ar sputtering pressure on the characteristics of TiO2 thin films was evaluated. Surface morphology and optical properties of TiO2 films were investigated using X-ray diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and UV–Vis spectrophotometry. Also, the refractive index and extinction coefficient of films were inferred by fitting spectrophotometric data. Schottky diode were fabricated by evaporation of Ni on TiO2 films. Current-voltage (I-V) measurements of Ni/TiO2 films showed that the rectifying properties of the device improves with the increasing of TiO2 film density and thickness. Therefore, the best I-V characteristic of the device was investigated depending on the temperature. Also, Ni/n-TiO2/p-Si/Al devices were fabricated to understand their transport mechanism.
Keywords:Films  Electrical properties
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