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Catalytic CVD growth and properties of a-C:H and a-C:N
Authors:H Nakayama  K Takatsuji  S Moriwaki  K Murakami  K Mizoguchi  M Nakayama  Y Miura
Affiliation:

a Department of Applied Physics, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi, Osaka 558-8585, Japan

b Department of Applied Chemistry, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi, Osaka 558-8585, Japan

Abstract:Hydrogenated amorphous carbon (a-C:H) and nitrided amorphous carbon (a-C:N) films have been synthesized on quartz substrates at a substrate temperature of 700 °C using a catalytic chemical vapor deposition (Cat-CVD) method. Raman spectra of a-C:H films showed two principal bands, the G-band at not, vert, similar1600 cm?1 and the D-band at not, vert, similar1350 cm?1. Those of a-C:N films showed similar spectra, with a G′ band at not, vert, similar1640 cm?1, the peak energy of which is higher than that of the G-band in a-C:H. The intensity ratio Image Image /ID, which is a measure of the degree of order in a-C:H, decreased for a-C:H with increasing CH4/H2 gas-flow ratio. On the contrary, the Image Image /ID ratio increased with increasing CH4/H2 gas-flow ratio.
Keywords:Catalytic chemical vapor deposition  Amorphous carbon  Amorphous carbon nitride  Raman scattering
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