Effects of Aliasing Errors on Microlithographic Image Computations |
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Authors: | Uwe Hollerbach |
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Affiliation: | (1) Department of Manufacturing Engineering, Boston University, Boston, Massachusetts, 02215 |
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Abstract: | Recent advances in computational microelectronics have made it possible to compute the images of very large masks. Images of entire masks require many gigabytes of storage. It is therefore desirable to make storage requirements as small as possible. In this paper, we investigate the effects of reducing resolution to the point where some aliasing error enters the final answer. Due to the accuracy requirements of the microelectronics industry, we conclude that reducing resolution to improve storage requirements is not feasible. |
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Keywords: | Aliasing microlithography aerial image |
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