Effect of tungsten on the electrochromic behaviour of sol-gel dip coated molybdenum oxide thin films |
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Authors: | M Dhanasankar G Muralidharan |
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Affiliation: | a Department of Physics, Kamaraj College of Engineering and Technology, Virudhunagar 626001, India b Department of Physics, The Gandhigram Rural Institute - Deemed University, Gandhigram 624302, Tamilnadu, India |
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Abstract: | The paper describes the results obtained on the performance of Mo oxide and mixed W/Mo oxide thin films for possible electrochromic applications. Mo and W/Mo oxide films were deposited on conductive (FTO) glass substrates using sol-gel dip coating method. The films were annealed at 250 °C for 30 min. The structure and morphology of Mo and W/Mo oxide films were examined using XRD, SEM and EDS. XRD results indicate the amorphous nature of the Mo and W/Mo oxide films annealed for 30 min. The CV measurements revealed that the films prepared with 10 wt.% of tungsten exhibit maximum anodic/cathodic diffusion coefficient of 24.99/12.71 × 10−11 cm2/s. The same film exhibits a maximum transmittance variation (ΔT%) of 83.4% at 630 nm and 81.06% at 550 nm with the optical density of 1.00 and 1.13 respectively. |
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Keywords: | A Thin films B Sol-gel chemistry D Electrochemical properties |
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