碳化硼薄膜制备的研究进展

综述了碳化硼材料的主要性能和制备碳化硼薄膜的主要方法,讨论了包括磁控溅射、离子束沉积和化学气相沉积等制备方法的优点及重要工艺参数,并就各方法指出了提高薄膜性能的主要措施,指出制备出更均匀、致密的碳化硼薄膜,提高薄膜与基体间的结合力,降低薄膜应力仍是今后研究的重点.

Research Progress in Fabrication of Boron Carbide Thin Film

The major properties of boron carbide and preparation methods of boron carbide thin film are reviewed.The advantages and important deposition parameters of these methods including DC/RF magnetron sputtering,ion beam evaporation and chemical vapor deposition are discussed,and the measures of improving the performances of boron carbide thin film are pointed out.It is evident from this review that intensive research still remains to be done and how to prepare the homogeneous boron carbide thin films with higher density,higher film-substrate adhesion and lower internal stress is the key study in the future.