首页 | 本学科首页   官方微博 | 高级检索  
     


Gain improvement in operational transconductance amplifiers using Graded-Channel SOI nMOSFETS
Authors:Salvador Pinillos Gimenez  Marcelo Antonio Pavanello  João Antonio Martino  Denis Flandre
Affiliation:a Centro Universitário da FEI, Av. Humberto de Alencar Castelo Branco, no. 3972, 09850-901 São Bernardo do Campo, Brazil
b Laboratório de Sistemas Integráveis, Escola Politécnica da Universidade de São Paulo, Av. Prof. Luciano Gualberto, trav. 3 n° 158, 05508-900 São Paulo, Brazil
c Laboratoire de Microélectronique, Université catholique de Louvain, Place du Levant 3, B-1348 Louvain-la-Neuve, Belgium
Abstract:This paper studies the performance of operational transconductance amplifiers (OTAs) fabricated with Graded-Channel (GC) SOI nMOSFETs and designed to provide high open-loop voltage gain or high gain-bandwidth characteristics. Different design targets were taken in account such as similar power dissipation, transconductance over drain current ratio and die area. Comparisons with OTAs made with conventional SOI nMOSFETs, are performed showing that the GC OTAs presents larger open-loop voltage gain without degrading the phase margin, unit gain frequency and slew rate simultaneously with a significant required die area reduction depending on LLD/L ratio used. Circuit simulations and experimental results are used to qualify the analysis.
Keywords:Analog circuits  Silicon on insulator technology  Graded-channel SOI nMOSFET  Operational transconductance amplifier  OTA
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号