Two-dimensional optical mask design and atom lithography |
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Authors: | A Rostami A Rahmani |
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Affiliation: | a Faculty of Electrical Engineering, Tabriz University, Tabriz 51664, Iran b OIC Research Lab., Faculty of Electrical Engineering, Tabriz University, Tabriz, Iran |
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Abstract: | Atom lithography is one of the latest proposals for high-resolution printing. The mask design and generation is key step for implementation of this method. In this paper, we have theoretically investigated and proposed a new method for two-dimensional optical mask design in atom lithography. A new method for realization of our proposed technique based on guided modes will present. With our proposed idea one can easily print every kind of two-dimensional patterns. This method can lead us to produce the nano-scale electronic and optical devices and systems. Also, a suitable algorithm for mask generation is proposed. |
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Keywords: | Atom lithography Gradient force One-dimensional atomic lens Two-dimensional optical mask Nano-technology |
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