| 直流磁控溅射技术制备TiNxOy薄膜 |
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| 引用本文： | 陈尔东,王聪,杨海刚,朱开贵.直流磁控溅射技术制备TiNxOy薄膜[J].中国材料科技与设备,2008,5(1):49-51. |
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| 作者姓名： | 陈尔东 王聪 杨海刚 朱开贵 |
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| 作者单位： | 北京航空航天大学凝聚态物理与材料物理研究中心,北京100083 |
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| 基金项目： | 国家自然科学基金资助项目（50471004）;新世纪优秀人才支持计划资助（NCET-05-0197） |
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| 摘 要： | 利用直流磁控溅射技术在玻璃衬底上制备了TiNxOy薄膜样品。发现薄膜的颜色、晶体结构、光学性质等都强烈依赖于反应气体的流量。利用光电子能谱（XPS）、X射线衍射（XRD）、UV—Vis分光光度计、扫描电子显微镜（SEM）等测试手段对样品进行表征。结果表明：随着O2流量的逐步增加，薄膜逐渐呈现非晶态，晶粒逐渐变小。薄膜结构从TiN到TiNxOy再向TiO2过渡。透射光谱显示从TiN的不透明逐渐增加到透明度为80％，且吸收阈发生蓝移。
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| 关 键 词： | TiNxOy 直流磁控溅射 吸收光谱 微观形貌 |
Preparation of TiNxOy Films by Direct Current Magnetron Sputtering |
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| CHEN Er-dong,WANG Cong ,YANG Hai-gang , ZHU Kai-gui.Preparation of TiNxOy Films by Direct Current Magnetron Sputtering[J].Chinese Materials Science Technology & Equipment,2008,5(1):49-51. |
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| Authors: | CHEN Er-dong WANG Cong YANG Hai-gang ZHU Kai-gui |
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| Affiliation: | (Center of Condensed Matter and Material Physics, Beihang University, Beijing,100083, China) |
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| Abstract: | TiNxOy thin films were prepared on glass substrates by direct current （DC） magnetron sputtering. The color, crystal structure, optical properties of the films were characterized by X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD）, UV-Vis spectrophotometer and scanning electron microscopy （SEM）. The results showed that： the absorption edge of the thin films was blue shifted. The structure became toward amorphous and the grain size became small with increasing of N2 flowing rate. |
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| Keywords: | TiNxOy DC magnetron sputtering Absorption spectra Microstructure |
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