Electrodeposition of bismuth telluride films from a nonaqueous solvent |
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Authors: | Wen-Jin Li |
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Affiliation: | Material and Chemical Research Laboratories, Industrial Technology Research Institute, Chutung, Hsinchu 310, Taiwan, ROC |
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Abstract: | The author examines Bi2Te3 deposition from a DMSO solution containing TeCl4 and Bi(NO3)3 × 5H2O by means of cyclic voltammetry and electrochemical quartz crystal microbalance (EQCM). Accumulated charges and related mass changes for Bi2Te3 deposition on working electrodes are measured in situ. The deposit composition is more dependent on Te4+ concentrations in DMSO solution than on the potential. In a DMSO solution containing 0.01 M Te4+ and 0.0075 M Bi3+, Bi2Te3 deposits were obtained in the potential range between −0.2 and −0.8 V vs. Ag/AgCl. In a DMSO solution containing 0.05 M Te4+ and 0.0375 M Bi3+, Te-rich deposits were formed from −0.2 to −0.8 V vs. Ag/AgCl. |
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Keywords: | Bi2Te3 film EQCM DMSO Electrodeposition Cyclic voltammetry |
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