A periodic array of silicon pillars fabricated by photoelectrochemical etching |
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Authors: | Xiaopeng Li Jung-Ho Lee |
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Affiliation: | Division of Materials & Chemical Engineering, Hanyang University, Ansan, Kyounggi-do 426-791, Republic of Korea |
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Abstract: | A periodic array of silicon pillars was photoelectrochemically fabricated using the two-step etching process with a n-type Si (1 0 0) substrate. Two key factors, backside illumination and anodic bias, were required to obtain a high-aspect ratio macropore array of silicon. It was found that the initial pore could be separated into two different pores when the applied anodic bias was greater than a certain critical value. The pore size of the macroporous silicon with a high porosity was increased by anisotropic etching in an alkaline solution. Due to destruction of the pore sidewalls, KOH etching allowed for the fabrication of silicon pillars on a large-scale wafer with an improved uniformity. The anisotropic etching behavior of KOH solution led to necking of the silicon pillars when the etching time exceeded 60 s. |
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Keywords: | Photoelectrochemical etching Silicon pillar array Pore separation Macroporous silicon KOH post-etching |
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