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Replication of high ordered nano-sphere array by nanoimprint lithography
Authors:Sung-Hoon Hong   Byeong-Ju Bae   Jae-Yeon Hwang   Seon-Yong Hwang  Heon Lee  
Affiliation:aDepartment of Materials Science and Engineering, Korea University, Anam-dong 5Ka-1, Sungbuk-Ku, Seoul 136-713, Republic of Korea
Abstract:High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.
Keywords:UV nanoimprint lithography   Hot embossing   DLC coating   Flexible polymer template
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