Adjustable refractive index modulation for a waveguide with SU-8 photoresist by dual-UV exposure lithography |
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Authors: | Ong Biow Hiem Yuan Xiaocong Tjin Swee Chuan |
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Affiliation: | Photonics Research Center, School of Electrical and Electronic Engineering, Nanyang Technological Univeristy, Singapore. |
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Abstract: | We present a new fabrication technique based on a two-step UV exposure lithographic process to marginally modulate the refractive index in commercial SU-8 photoresist. This technique achieves refractive index modulation as different regions undergo different thermal densification prior to UV-induced polymerization. A small refractive index contrast of 0.0008 or lower can be achieved, and this is especially useful for fabricating waveguides with a low level of propagation modes. This technique may be extended to other UV-curable epoxy photoresists and can easily be applied in the fabrication of optical elements such as optical interconnects and integrated optical sensors without the development process. |
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