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High average power UV generation at 0.266 μm inBeSO4·4H2O |
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| Authors: | Kato K. |
| Affiliation: | Japan Defence Agency, Tokyo; |
| Abstract: | A report on the efficient generation of highly stable 1.7-W average power UV pulses at 0.266 μm in BeSO4·4H2O is presented. BeSO4·4H2O has been found to be a superior material for high peak-power and high average-power UV generation at 0.266 μm. A Gaussian-like beam having an average power of 1.7 W was generated without damage to the crystal at room temperature |
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