Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition |
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Authors: | Rony Snyders Kaiyun Jiang Denis Music Stephanos Konstantinidis Torsten Markus Alexander Reinholdt Joachim Mayer Jochen M Schneider |
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Affiliation: | aMaterials Chemistry, RWTH Aachen University, Mies-van-der-Rohe-Strasse 10, D-52074 Aachen, Germany;bResearch Center Jülich, Institute for Materials and Processes in Energy Systems (IWV-2), 52425 Jülich, Germany;cCentral Facility for Electron Microscopy, RWTH Aachen University, Ahornstr. 55, D-52074 Aachen, Germany |
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Abstract: | We have studied the correlation between the chemical composition, constitution and morphology of Al2O3 using experimental and theoretical means. Combining scanning electron microscopy, transmission electron microscopy, electron dispersive X-ray analysis and ab initio calculations, we have investigated the formation of pores. Desorption measurements show chlorine release from γ- and α-alumina films. Based on ab initio calculations, we have established that Cl can be incorporated in both γ- and α-alumina. Furthermore, two Cl atoms are likely to agglomerate since the total energy is reduced, compared to an unagglomerated configuration. We propose that Cl agglomeration is the first step towards Cl2 formation and subsequent precipitation and bubble formation. It can be learned that the Cl incorporation has to be minimized during growth of dense alumina coatings. |
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Keywords: | PECVD alumina Cl incorporation Bubble formation Ab initio calculations |
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