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Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition
Authors:Rony Snyders  Kaiyun Jiang  Denis Music  Stephanos Konstantinidis  Torsten Markus  Alexander Reinholdt  Joachim Mayer  Jochen M Schneider  
Affiliation:aMaterials Chemistry, RWTH Aachen University, Mies-van-der-Rohe-Strasse 10, D-52074 Aachen, Germany;bResearch Center Jülich, Institute for Materials and Processes in Energy Systems (IWV-2), 52425 Jülich, Germany;cCentral Facility for Electron Microscopy, RWTH Aachen University, Ahornstr. 55, D-52074 Aachen, Germany
Abstract:We have studied the correlation between the chemical composition, constitution and morphology of Al2O3 using experimental and theoretical means. Combining scanning electron microscopy, transmission electron microscopy, electron dispersive X-ray analysis and ab initio calculations, we have investigated the formation of pores. Desorption measurements show chlorine release from γ- and α-alumina films. Based on ab initio calculations, we have established that Cl can be incorporated in both γ- and α-alumina. Furthermore, two Cl atoms are likely to agglomerate since the total energy is reduced, compared to an unagglomerated configuration. We propose that Cl agglomeration is the first step towards Cl2 formation and subsequent precipitation and bubble formation. It can be learned that the Cl incorporation has to be minimized during growth of dense alumina coatings.
Keywords:PECVD alumina  Cl incorporation  Bubble formation  Ab initio calculations
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