| 碲氧溅射薄膜的光学性质 |
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| 引用本文： | 陆家福,俞大渨,方之耀. 碲氧溅射薄膜的光学性质[J]. 无机材料学报, 1990, 0(2) |
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| 作者姓名： | 陆家福 俞大渨 方之耀 |
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| 作者单位： | 中国科学院上海硅酸盐研究所(陆家福，俞大渨)，中国科学院上海硅酸盐研究所(方之耀) |
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| 摘 要： | 碲氧薄膜是很有希望的可擦写光盘介质材料。本文用射频溅射技术制备碲氧系统的薄膜。测定热处理前后薄膜的光学特性(光透过率、反射率、折射指数、光吸收系数和光能隙)和 X 射线衍射特性,并研究了这些性能与靶材的组份关系,还测定了这些薄膜激光喇曼光谱,并讨论它们的结构特征。
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| 关 键 词： | 薄膜 碲氧薄膜 可擦写光盘 介质 |
Optical Properties of Te-O Sputtering Thin Films |
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| Lu Jiafu Yu Daiwei Fang Ziyao. Optical Properties of Te-O Sputtering Thin Films[J]. Journal of Inorganic Materials, 1990, 0(2) |
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| Authors: | Lu Jiafu Yu Daiwei Fang Ziyao |
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| Abstract: | The Te-O thin film as a reversible optical recording medium is a very promi-sing material.In our laboratory,this film was prepared by rf-diode sputteringtechnique,the optical properties,such as trasmissivity,reflectance,absorption coef-ficient,optical gap,and the X-ray diffraction characteristics as well as the Ramanspectra of the film obtained were measured before and after heat treatment.Therelationship between the optical properties measured and the compositions of thesputtering targets used was studied,and the structural characteristics of the filmdiscussed. |
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| Keywords: | Thin film Te-O thin films Reversibie optical recording media |
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