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Interfacial reactions of Si/Co films on GaAs
Authors:J. S. Kwak  H. N. Kim  H. K. Baik  D. W. Shin  C. G. Park  C. S. Kim  S. K. Noh
Affiliation:(1) Department of Metallurgical Engineering, Yonsei University, 120-749 Seoul, Korea;(2) Department of Materials Science and Engineering, POSTECH, 790-600 Pohang, Korea;(3) KRISS, Materials Evaluation Center, 305-606 Daejon, Korea
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